Product description
This is a shield with a certain pattern engraved to selectively transmit light.
Using photomasks, many circuits and patterns can be formed.
Photomasks are used as a substrate for microcircuits used in semiconductor integrated circuits (LSI), flat panel displays (LCDs, OLEDs), and printed circuit boards (PCBs).
Product Inquiry
For product inquiries, please contact the person in charge.
Features
- Large area
- Ultra precision
- Low cost
- Implementation of high precision pattern
Fine CD : Chrome 0.6um, Space 1.0um
Transmittance control : 4% ~ 55%
- We have the original technology of large area photo mask
Available for mask for the world's first 8.5 generation:1,220x1,400mm(13t)
We own such technologies as Quartz Polishing, Cr sputtering, PR Coating
- Developed the world's first Large Area Pattern Generator
Product type
| Category | Specification |
|---|---|
| Binary Mask | CD Tolerance ≤± 0.20um, Range ≤0.25um |
| Fine-Slit Mask | CD Tolerance ≤± 0.10um, Range ≤0.10um |
| Half-tone Mask | Transmittance Tolerance ≤± 1.0% Uniformity ≤ 2.0% |
| Multi-tone Mask | Transmittance Target : 4% ~ 55% (3-tone or over) |
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