Product description
This is a shield with an engraved pattern that selectively transmits light.
Several circuits and patterns can be formed using photo masks.
Photo masks are used as a substrate for microcircuits during the production of semiconductor integrated circuits (LSI), flat panel displays (LCDs, OLEDs), and printed circuit boards (PCBs).
Product Inquiry
For product inquiries, please contact the person in charge.
Features
- Large Area Coverage
- Ultraprecision
- Low Cost
- Implementation of high precision pattern
Fine CD: Chrome 0.6 µm, Space 1.0 µm
Transmittance control: 4% - 55%
- Development of the original large area photo mask
Available mask for the world's first 8.5 generation: 1,220 mm × 1,400mm(13 t)
We have secured ownership for technologies such as Quartz Polishing, Cr sputtering, and PR Coating.
- Developed the world's first Large Area Pattern Generator
Product Type
| Category | Specifications |
|---|---|
| Binary Mask | CD Tolerance ≤ ± 0.20 µm, Range ≤ 0.25 µm |
| Fine-Slit Mask | CD Tolerance ≤ ± 0.10 µm, Range ≤ 0.10 µm |
| Half-tone Mask | Transmittance Tolerance ≤ ± 1% Uniformity ≤ 2% |
| Multi-tone Mask | Transmittance Target: 4% - 55% (3-tone or over) |
Related News
| Date | Title |
|---|---|
| No items found. | |